Yan H, Xue S, Guo P, He J, Wang G, Zeng Y, Qie L, Wang R. Research progress of low-temperature plasma polishing technology in chip material processing. Clean Energy Sci. Technol. [Internet]. 2024 Nov. 21 [cited 2024 Nov. 24];2(4):263. Available from: https://cae.usp-pl.com/index.php/cest/article/view/263