YAN, H.; XUE, S.; GUO, P.; HE, J.; WANG, G.; ZENG, Y.; QIE, L.; WANG, R. Research progress of low-temperature plasma polishing technology in chip material processing. Clean Energy Science and Technology, [S. l.], v. 2, n. 4, p. 263, 2024. DOI: 10.18686/cest263. Disponível em: https://cae.usp-pl.com/index.php/cest/article/view/263. Acesso em: 24 nov. 2024.